Abstract
“Closed field” magnetron (CFM) sputtering offers high throughput, flexible deposition process for optical coatings and thin films required in display technologies. CFM sputtering uses two or more different metal targets to deposit multilayers comprising a wide range of dielectrics, metals and conductive oxides. CFM provides a room temperature deposition process with high ion current density, low bias voltage and reactive oxidation in the entire volume around the rotating substrate drum carrier, depositing films over a large surface area at a high rate with excellent and reproducible properties. Machines based on CFM are scaleable to meet a range of batch and in-line size requirements. Thin film thickness control to <±1% is accomplished using time, although quartz crystal or optical monitoring are used for more demanding applications. Fine layer thickness control and deposition of graded index layers is also assisted with a special rotating shutter mechanism. This paper presents data on optical properties for CFM deposited coatings relevant to displays, including anti-reflection, IR blocker and color and thermal control filters, graded coatings, barrier coatings as well as conductive transparent oxides such as indium tin oxide. Benefits of the CFM process for a range of display technologies; OLED, EL and projection are described.
