21 October 2004 Optical properties of TiO2-x thin films studied by spectroscopic ellipsometry: substrate temperature effect
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Proceedings Volume 5622, 5th Iberoamerican Meeting on Optics and 8th Latin American Meeting on Optics, Lasers, and Their Applications; (2004) https://doi.org/10.1117/12.590793
Event: 5th Iberoamerican Meeting on Optics and 8th Latin American Meeting on Optics, Lasers, and Their Applications, 2004, Porlamar, Venezuela
Abstract
Titanium oxide thin films were obtained by reactive dc-magnetron sputtering. A target of titanium (Lesker; 99.9% pure) and a mixture of argon and oxygen gases were used to deposit titanium oxide films onto silicon and glass substrates. The substrate temperature was varied between 200 and 400°C. Optical constants have been determined by spectroscopic ellipsometry and by using the optical transmittance data from UV-Vis spectrometry. The effect of substrate temperature on the optical properties is analyzed. Results indicate an increase in the refractive index of the films with substrate temperature, which is attributed to changes in the oxygen content, density and degree of crystallization of the films.
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M. A. Camacho-Lopez, M. A. Camacho-Lopez, Celia A. Sanchez-Perez, Celia A. Sanchez-Perez, A. Esparza-Garcia, A. Esparza-Garcia, E. Ghibaudo, E. Ghibaudo, S. Rodil, S. Rodil, S. Muhl, S. Muhl, L. Escobar-Alarcon, L. Escobar-Alarcon, } "Optical properties of TiO2-x thin films studied by spectroscopic ellipsometry: substrate temperature effect", Proc. SPIE 5622, 5th Iberoamerican Meeting on Optics and 8th Latin American Meeting on Optics, Lasers, and Their Applications, (21 October 2004); doi: 10.1117/12.590793; https://doi.org/10.1117/12.590793
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