Paper
31 January 2005 GaAs/GaAs0.89Sb0.11 double heterojunction bipolar transistors (DHBTs) grown by SSMBE with a GaAs decomposition source
Ping-Juan Niu, Haiyang Hu, Hong-Wei Dong, Wenxin Wang, Junming Zhou
Author Affiliations +
Abstract
For reducing turn-on voltage of GaAs-based HBT, Al0.25Ga0.75As/GaAs0.89Sb0.11/GaAs DHBTs on GaAs (001) is successfully grown by solid-source molecular beam epitaxy (SSMBE) with a GaAs decomposition source, no misfit dislocation in the base layer was found by observation of SEM. It suggests that GaAsSb base layer is fully strained. Device with 75x75μm2 emitter mesa area is fabricated using this structure and yielded an excellent performance with high current gain of 30 at the collector current density of 2×103A/cm2 and low turn-on voltage of 0.8V. Due to the smaller band gap of the GaAsSb base layer, GaAsSb is useful material for reducing turn-on voltage of GaAs-based HBTs.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ping-Juan Niu, Haiyang Hu, Hong-Wei Dong, Wenxin Wang, and Junming Zhou "GaAs/GaAs0.89Sb0.11 double heterojunction bipolar transistors (DHBTs) grown by SSMBE with a GaAs decomposition source", Proc. SPIE 5624, Semiconductor and Organic Optoelectronic Materials and Devices, (31 January 2005); https://doi.org/10.1117/12.575247
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Cited by 2 scholarly publications.
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KEYWORDS
Gallium arsenide

Antimony

Heterojunctions

Aluminum

Transistors

Gallium

Scanning electron microscopy

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