6 May 1985 Calibration Of Surface Roughness Transducers At Angstrom Levels Using X-Ray Interferometry
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An x-ray interferometer for calibration of microdisplacement transducers at sub nm levels is under development. Using the lattice spacing of high perfection semiconductor industry grade silicon as a reference, the objective is to produce a portable, absolute length standard with a precision of 1 part in 108 traceable to primary standards. The interferometer is of the Hart design and fabricated from a monolith of single crystal silicon. The triple-blade construction utilises Lauecase diffraction in beam splitter, mirror and analyser and is capable of an ultimate resolution of about 10 pm. The system is now operational, and the first trials, reported in this paper, have been entirely successful.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. K. Bowen, D. G. Chetwynd, and S. T. Davies "Calibration Of Surface Roughness Transducers At Angstrom Levels Using X-Ray Interferometry", Proc. SPIE 0563, Applications of Thin Film Multilayered Structures to Figured X-Ray Optics, (6 May 1985); doi: 10.1117/12.949695; https://doi.org/10.1117/12.949695

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