9 February 2005 A new method for measuring a small displacement by using the critical angle method and confocal technology
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Abstract
A new method for measuring a very small displacement is presented. The principles of the measurement are based on the critical angle method and confocal technology. It will increase the lateral and longitudinal resolutions higher than 0.3μm and 5nm, respectively, and the maximum displacement could be above 12μm. This optical structure could be applied to measure some messages for optical surface, bio-medical science, and nanotechnology in the future. The new technique has some merits, such as a simple and compact optical setup, high sensitivity, and high resolution.
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Shu-Jen Liao, Shu-Jen Liao, Shinn-Fwu Wang, Shinn-Fwu Wang, Ming-Hung Chiu, Ming-Hung Chiu, } "A new method for measuring a small displacement by using the critical angle method and confocal technology", Proc. SPIE 5635, Nanophotonics, Nanostructure, and Nanometrology, (9 February 2005); doi: 10.1117/12.572739; https://doi.org/10.1117/12.572739
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