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9 February 2005 Influence of preparation technique on the microscopic structure and surface morphology of nanometer TiO2 thin films
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Abstract
Nanometer TiO2 thin films are prepared by a sol-gel method and the effects of preparation technique on the microstructure and surface morphology of the obtained materials are studied using X-ray Diffraction [XRD,IR spectrum[IR], UV-VIS spectrum [UV-VIS,AFM and X-ray photoelectron spectroscopy[XPS]. The results show that the TiO2 thin films are of anatase and rutile phase structures when annealed in a temperature range from 450°C to 600°C. When heated up to 700°C, the structure of TiO2 film changed into rutile completely. In the TiO2 thin films, there is some residual carbon from the starting organometallic components and a small amount of sodium ions diffused from the glass substrates. During heat-treatment, the absorption peak of water become weak gradually and the organic groups are disappeared completely at 500°C. Optimum film layers are obtained for the UV absorbance index. AFM result shows that the rough morphology of surface [RMS] of films is about 2-3nm or so.
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Xiaoyun Hu, Jun Fan, Ting Li, Dekai Zhang, Jintao Bai, and Xun Hou "Influence of preparation technique on the microscopic structure and surface morphology of nanometer TiO2 thin films", Proc. SPIE 5635, Nanophotonics, Nanostructure, and Nanometrology, (9 February 2005); https://doi.org/10.1117/12.575510
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