9 February 2005 Nanostructure generation based on laser cooling and mechanical mask
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The basic principle and the overall scheme of a new technique for nanostructure fabarication are described, and experimental results are given. A thermal atomic beam effusing out of an oven is firstly collimated by a small aperture and then collimated to a high degree by a polarization gradient laser field. This well-collimated atomic beam is patterned by a mechanical mask, and nanostructures are generated by atomic deposition. SEM profiles of nanostructures have shown that the feature size of the structure can reach nanometer scale. Compared to other micro-lithographic techniques, this technique has many advantages such as low cost, high throughput, mass production, simple process etc.
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Xian Zhong Chen, Xian Zhong Chen, Ting Wen Xing, Ting Wen Xing, Jian Ping Shi, Jian Ping Shi, Xu Nan Chen, Xu Nan Chen, Han Min Yao, Han Min Yao, } "Nanostructure generation based on laser cooling and mechanical mask", Proc. SPIE 5635, Nanophotonics, Nanostructure, and Nanometrology, (9 February 2005); doi: 10.1117/12.568785; https://doi.org/10.1117/12.568785

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