9 February 2005 Nanostructure generation based on laser cooling and mechanical mask
Author Affiliations +
Abstract
The basic principle and the overall scheme of a new technique for nanostructure fabarication are described, and experimental results are given. A thermal atomic beam effusing out of an oven is firstly collimated by a small aperture and then collimated to a high degree by a polarization gradient laser field. This well-collimated atomic beam is patterned by a mechanical mask, and nanostructures are generated by atomic deposition. SEM profiles of nanostructures have shown that the feature size of the structure can reach nanometer scale. Compared to other micro-lithographic techniques, this technique has many advantages such as low cost, high throughput, mass production, simple process etc.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xian Zhong Chen, Xian Zhong Chen, Ting Wen Xing, Ting Wen Xing, Jian Ping Shi, Jian Ping Shi, Xu Nan Chen, Xu Nan Chen, Han Min Yao, Han Min Yao, } "Nanostructure generation based on laser cooling and mechanical mask", Proc. SPIE 5635, Nanophotonics, Nanostructure, and Nanometrology, (9 February 2005); doi: 10.1117/12.568785; https://doi.org/10.1117/12.568785
PROCEEDINGS
8 PAGES


SHARE
Back to Top