Paper
10 February 2005 Research on novel beam homogenizer for excimer laser and evaluating norm of beam uniformity
Hong-xia Li, Qi-hong Lou, Zhenhuan Ye, J. Dong, Y. Wei, L. Ling
Author Affiliations +
Abstract
A novel trapezoid prism homogenizer is used to improve the uniformity of output energy density of excimer laser. The principle and the design requirements of the novel trapezoid prism are analyzed theoretically, and the optimal position of uniform section is calculated. Using this novel homogenizer, the fluctuation of beam uniformity of XeCl excimer laser is less than 4%. The result is better than that obtained from a normal prism homogenizer. The evaluating norms of excimer laser beam uniformity are analyzed in detail. The process window defines uniformity requirements of excimer laser, while the energy fraction answers the problem of useful percentage of energy within a giving process window. The top-hat factor defines the uniformity in the whole energy range, and the dynamic range is the variation range of screen-homogenizer in the specific application. Using this evaluating norm the uniform beam obtained by the novel trapezoid prism homogenizer is analyzed.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hong-xia Li, Qi-hong Lou, Zhenhuan Ye, J. Dong, Y. Wei, and L. Ling "Research on novel beam homogenizer for excimer laser and evaluating norm of beam uniformity", Proc. SPIE 5638, Optical Design and Testing II, (10 February 2005); https://doi.org/10.1117/12.575934
Lens.org Logo
CITATIONS
Cited by 3 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Prisms

Excimer lasers

Beam homogenizers

Beam analyzers

Beam splitters

Excimers

Laser cutting

RELATED CONTENT

Single-shot measurement of UV ultrashort pulse laser
Proceedings of SPIE (May 16 2013)
Neon reduction program on Cymer ArF light sources
Proceedings of SPIE (March 15 2016)
N2 laser stereo-lithography
Proceedings of SPIE (November 06 2000)
Excimer lamp stereolithography
Proceedings of SPIE (June 07 2000)
Laser action on the F, He, Ne, Ar atoms and...
Proceedings of SPIE (May 31 2006)

Back to Top