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17 January 2005 Circuit model of double photodiodes for high-speed OEIC receivers
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Photo-generated carriers' transmission delay of a CMOS-Process-Compatible double photo-diode (DPD) is analyzed by using device simulation in this paper. The carriers' transmission delay of a DPD in CMOS N-well process consists of three parts: the delay in the P+ region, in the depletion region and in the N-well. The DPD equivalent circuit model, including photo-generated carriers' transmission delay, is given by means of device simulation. By comparing with different depth of the N-well and different area of the DPD, the delay of the diffusion part in the N-well and the delay of the junction capacitance are the most significant factors to determine the delay time of a DPD. In addition, the diffusion delay is relative to the depth, the doping concentration of the N-well and the bias. Adopting smaller size CMOS process is of benefit to improving the speed due to the shallow well, nevertheless the shallow well can cause the responsivity reduce. The responsivity reduce can be compensated by increasing the junction area.
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Lu-Hong Mao, Yongquan Chen, Wei Li, Min Chen, Huilai Liang, Shi-lin Zhang, and Weilian Guo "Circuit model of double photodiodes for high-speed OEIC receivers", Proc. SPIE 5644, Optoelectronic Devices and Integration, (17 January 2005);


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