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27 January 2005 Lithography simulation in semiconductor manufacturing
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Abstract
In the 30 years since lithography modeling was first introduced, optical lithography simulation has progressed from a curiosity, to a research and development tool, and finally to a manufacturing tool. While much has been published on new developments in lithography simulators and their use in advanced lithography development, less is published on how simulators have been used and are soon to be used in semiconductor manufacturing flows. This review paper will describe the most popular and useful examples today for lithography simulators in a manufacturing environment.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chris A. Mack "Lithography simulation in semiconductor manufacturing", Proc. SPIE 5645, Advanced Microlithography Technologies, (27 January 2005); https://doi.org/10.1117/12.584441
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