Giant magnetostrictive iron-based alloy thin film for optical scanner

Atsushi Kadowaki; Yoshitake Nishi; Mitsuaki Takeuchi; Yoshihito Matsumura

doi:10.1117/12.582330

16 February 2004 Giant magnetostrictive iron-based alloy thin film for optical scanner

Atsushi Kadowaki, Yoshitake Nishi, Mitsuaki Takeuchi, Yoshihito Matsumura

Proceedings Volume 5648, Smart Materials III; (2004) https://doi.org/10.1117/12.582330
Event: Smart Materials, Nano-, and Micro-Smart Systems, 2004, Sydney, Australia

Abstract

To develop an optical scanning device, the magnetostrictive alloy thin films were prepared on silicon wafer and polyimide substrate by d.c. magnetoron sputtering process. The TbFe1.8 film shows a giant positive magnetostriction of about 1200 ppm at 5 kOe, whereas the SmFe2.5 shows a giant negative magnetostriction of about 1200 ppm. The magnetostrictive alloy thin films device showed reproducibility below 5 kOe of magnetic field.

Citation Download Citation

Atsushi Kadowaki, Yoshitake Nishi, Mitsuaki Takeuchi, and Yoshihito Matsumura "Giant magnetostrictive iron-based alloy thin film for optical scanner", Proc. SPIE 5648, Smart Materials III, (16 February 2004); https://doi.org/10.1117/12.582330

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