16 February 2004 Giant magnetostrictive iron-based alloy thin film for optical scanner
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Abstract
To develop an optical scanning device, the magnetostrictive alloy thin films were prepared on silicon wafer and polyimide substrate by d.c. magnetoron sputtering process. The TbFe1.8 film shows a giant positive magnetostriction of about 1200 ppm at 5 kOe, whereas the SmFe2.5 shows a giant negative magnetostriction of about 1200 ppm. The magnetostrictive alloy thin films device showed reproducibility below 5 kOe of magnetic field.
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Atsushi Kadowaki, Yoshitake Nishi, Mitsuaki Takeuchi, Yoshihito Matsumura, "Giant magnetostrictive iron-based alloy thin film for optical scanner", Proc. SPIE 5648, Smart Materials III, (16 February 2004); doi: 10.1117/12.582330; https://doi.org/10.1117/12.582330
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