28 February 2005 Micromirror structure based on TiNi shape memory thin films
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Abstract
TiNi films were deposited on silicon by co-sputtering TiNi target and a separate Ti target at a temperature of 450°C. Results from differential scanning calorimeter, in-situ X-ray diffraction and curvature measurement revealed clearly martensitic transformation upon heating and cooling. Two types of TiNi/Si optical micromirror structures with a Si mirror cap (20 micron thick) and TiNi/Si actuation beams were designed and fabricated. For the first design, three elbow shaped Si beams with TiNi electrodes were used as the arms to actuate the mirror. In the second design, a V-shaped cantilever based on TiNi/Si bimorph beams was used as the actuation mechanism for micromirror. TiNi electrodes were patterned and wet-etched in a solutions of HF:HNO3:H2O (1:1:20) with an etch rate of 0.6 μm/min. The TiNi/Si microbeams were flat at room temperature, and bent up with applying voltage in TiNi electrodes (due to phase transformation and shape memory effect), thus causing the changes in angles of micromirror.
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Yong Qing Fu, Min Hu, Hejun Du, Jack Luo, Andrew J. Flewitt, William I. Milne, "Micromirror structure based on TiNi shape memory thin films", Proc. SPIE 5649, Smart Structures, Devices, and Systems II, (28 February 2005); doi: 10.1117/12.567317; https://doi.org/10.1117/12.567317
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