Precision Wafer-Stepper Alignment And Metrology Using Diffraction Gratings And Laser Interferometry

S. Wittekoek; H. Linders; H. Stover; G. Johnson; D. Gallagher; R. Fergusson

doi:10.1117/12.949728

2 January 1986 Precision Wafer-Stepper Alignment And Metrology Using Diffraction Gratings And Laser Interferometry

S. Wittekoek, H. Linders, H. Stover, G. Johnson, D. Gallagher, R. Fergusson

Proceedings Volume 0565, Micron and Submicron Integrated Circuit Metrology; (1986) https://doi.org/10.1117/12.949728
Event: 29th Annual Technical Symposium, 1985, San Diego, United States

Abstract

This article briefly reviews the unique features of the ASM Lithography wafer stepper that make it extremely well suited for precision metrology applications, and presents techniques and procedures developed for use in wafer-stepper manufacture (i.e., final assembly, final test, quality assurance, and field service). The procedures lead to unprecedented tight tolerances on some machine specifications, and to settings of maximum latitude for some other machine specifications. It is believed that these developments and other similar procedures will become requirements in machine manufacturing as the current trends in IC chip production continue to unfold (i.e., machine matching, tighter overlay design rules, larger exposure fields, larger wafers, etc.)

Citation Download Citation

S. Wittekoek, H. Linders, H. Stover, G. Johnson, D. Gallagher, and R. Fergusson "Precision Wafer-Stepper Alignment And Metrology Using Diffraction Gratings And Laser Interferometry", Proc. SPIE 0565, Micron and Submicron Integrated Circuit Metrology, (2 January 1986); https://doi.org/10.1117/12.949728

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