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2 January 1986 Precision Wafer-Stepper Alignment And Metrology Using Diffraction Gratings And Laser Interferometry
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Abstract
This article briefly reviews the unique features of the ASM Lithography wafer stepper that make it extremely well suited for precision metrology applications, and presents techniques and procedures developed for use in wafer-stepper manufacture (i.e., final assembly, final test, quality assurance, and field service). The procedures lead to unprecedented tight tolerances on some machine specifications, and to settings of maximum latitude for some other machine specifications. It is believed that these developments and other similar procedures will become requirements in machine manufacturing as the current trends in IC chip production continue to unfold (i.e., machine matching, tighter overlay design rules, larger exposure fields, larger wafers, etc.)
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. Wittekoek, H. Linders, H. Stover, G. Johnson, D. Gallagher, and R. Fergusson "Precision Wafer-Stepper Alignment And Metrology Using Diffraction Gratings And Laser Interferometry", Proc. SPIE 0565, Micron and Submicron Integrated Circuit Metrology, (2 January 1986); https://doi.org/10.1117/12.949728
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