23 February 2005 Frequency dependency of the characteristics in spiral-type thin film inductors
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Abstract
In this study, spiral inductors on the SiO2/Si(100) substrate were fabricated by the magnetron sputtering method. Cu thin film with the thickness of 0.7~2.0 μm was deposited on the substrate. Square inductors were fabricated through the wet chemical etching technique. The inductors are completely specified by the number of turns, coil width and the coil spacing. Both the width and spacing were varied from 10 to 50 μm and from 20 to 70 μm, respectively. The Frequency dependency of inductance and Q factor were investigated to analyze the performance of spiral inductors.
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Bok-Ki Min, Bok-Ki Min, In-Sung Kim, In-Sung Kim, Jae-Sung Song, Jae-Sung Song, } "Frequency dependency of the characteristics in spiral-type thin film inductors", Proc. SPIE 5650, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II, (23 February 2005); doi: 10.1117/12.582204; https://doi.org/10.1117/12.582204
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