8 October 2004 Characteristic of diffractive optical element for arbitrary pattern beam shaping
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Proceedings Volume 5662, Fifth International Symposium on Laser Precision Microfabrication; (2004) https://doi.org/10.1117/12.596369
Event: Fifth International Symposium on Laser Precision Microfabrication, 2004, Nara, Japan
Abstract
Laser materials processing has been used increasingly over the wide area of electronic industries, especially for drilling microvias in printed circuit boards, and poly-silicon annealing for thin film transistor of liquid crystal display. Intensity distribution of laser beam is usually a non-uniform gaussian profile. Therefore, the demand for uniform intensity distribution is rising rapidly in some applications of heat processing. To obtain higher uniformity, beam homogenizer of a diffractive optical element (DOE) has recently been developed and introduced to some promising applications. Through the improvement of optical design algorithms and micro-fabrication techniques of a phase pattern of DOE, it becomes possible to convert a non-uniform gaussian distribution not only into a simple distribution like a square and a line but also into a complicated distribution like a distribution of printed circuit pattern. In this study, we introduce a design and fabrication result of beam shaper of DOE that can convert a gaussian distribution into the distribution of a printed circuit pattern, and present the possibility and the point at issue of new laser material processing by using such optics.
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Takayuki Hirai, Takayuki Hirai, Keiji Fuse, Keiji Fuse, Kenichi Kurisu, Kenichi Kurisu, Keiji Ebata, Keiji Ebata, Kyoji Matsushima, Kyoji Matsushima, } "Characteristic of diffractive optical element for arbitrary pattern beam shaping", Proc. SPIE 5662, Fifth International Symposium on Laser Precision Microfabrication, (8 October 2004); doi: 10.1117/12.596369; https://doi.org/10.1117/12.596369
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