Pulsed excimer lasers for thin film applications

Ralph F. Delmdahl

doi:10.1117/12.596760

8 October 2004 Pulsed excimer lasers for thin film applications

Ralph F. Delmdahl

Proceedings Volume 5662, Fifth International Symposium on Laser Precision Microfabrication; (2004) https://doi.org/10.1117/12.596760
Event: Fifth International Symposium on Laser Precision Microfabrication, 2004, Nara, Japan

Abstract

Ongoing progress in material research and processing industry is fueled to a large extent by the technique of pulsed laser deposition (PLD). With this powerful and versatile deposition method, multi-component target materials can be ablated and deposited onto a substrate to form functional layers with tailored physical properties. Monitoring of growth parameters such as thickness and surface roughness is mostly performed in-situ via electron diffraction or other diagnostic tools. High pulse energy excimer lasers with photon energies as high as 7.9 eV lend maximum flexibility to the technique of pulsed laser deposition since virtually every target material is amenable to excimer laser ablation and its subsequent stoichiometric transfer to a substrat. Spectral properties as well as recent technical advances in excimer lasers for thin film applications are shown in this paper.

Citation Download Citation

Ralph F. Delmdahl "Pulsed excimer lasers for thin film applications", Proc. SPIE 5662, Fifth International Symposium on Laser Precision Microfabrication, (8 October 2004); https://doi.org/10.1117/12.596760

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