12 April 2005 New laser patterning technology with dynamic focus control for 3D MIDs (Invited Paper)
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Abstract
We have developed an original laser structuring process for MIDs in harmony with laser patterning technology recently displaying remarkable technical innovation.. For creating MID products, conventional patterning technology is unable to meet the requirements for complicated three-dimensional shapes, finer circuits and higher accuracy because of involving the following problems. 1) It is difficult to execute highly accurate and fine circuit patterning on surfaces at a 90° angle with level difference of 4mm or over. 2) It is difficult to assure the quality on surfaces such as sloped surfaces where the workability is varied. 3) The productivity is lowered due to fine circuit patterning. We have solved the above problems through dynamic control of laser structuring parameters, using a dynamic focusing system, and it has enabled the following improvements. 1) Successive laser patterning on surfaces with level difference of 10mm. 2) Fine circuit (track/gap = 30μm/30μm) patterning in same circuit on surfaces at a 90°angle. 3) Quality assurance and productivity improvement by structuring parameters best for patterning.
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Toshiyuki Suzuki, T. Shindo, Shingo Yuasa, "New laser patterning technology with dynamic focus control for 3D MIDs (Invited Paper)", Proc. SPIE 5713, Photon Processing in Microelectronics and Photonics IV, (12 April 2005); doi: 10.1117/12.593358; https://doi.org/10.1117/12.593358
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KEYWORDS
Optical lithography

Laser applications

Laser processing

Beam controllers

Control systems

Laser development

Copper

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