Paper
12 April 2005 Optical properties of pulsed-laser deposited BaTiO3 thin films
Jie Xu, Daniel P. Durisin, Gregory W. Auner
Author Affiliations +
Abstract
Thin films of barium titanate (BaTiO3) have been grown on Si (100) and UV fused silica substrates using KrF pulsed-laser deposition (PLD). The films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and UV/VIS/NIR spectroscopy. Smooth and stoichiometric films were grown on Si (100) substrate at O2 pressure range of 10-30 mTorr and substrate temperature of 600°C-620°C. The XRD patterns of the films revealed the polycrystalline peaks with a preferential orientation. The optical properties of BaTiO3 films were investigated in terms of UV-VIS transmission spectrum of the films deposited on UV fused silica substrate. The spectral dependences of refractive index and absorption coefficient, and the thickness of the films have been calculated from optical transmission measurements using the envelope method. The band gap energy (Eg) of BaTiO3 films was found to be 3.35eV.
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Jie Xu, Daniel P. Durisin, and Gregory W. Auner "Optical properties of pulsed-laser deposited BaTiO3 thin films", Proc. SPIE 5713, Photon Processing in Microelectronics and Photonics IV, (12 April 2005); https://doi.org/10.1117/12.584639
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KEYWORDS
Silica

Silicon

Refractive index

Absorption

Optical properties

Transmittance

Thin films

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