22 January 2005 Electron-beam lithography for micro- and nano-optical applications
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Direct-write electron-beam lithography has proven to be a powerful technique for fabricating a variety of micro and nano-optical devices. Binary E-beam lithography is the workhorse technique for fabricating optical devices that require complicated precision nano-scale features. We describe a bi-layer resist system and virtual-mark height measurement for improving the reliability of fabricating binary patterns. Analog E-beam lithography is a newer technique that has found significant application in the fabrication of diffractive optical elements. We describe our techniques for fabricating analog surface-relief profiles in E-beam resist, including a technique for overcoming the problem of resist heating. We also describe a multiple field size exposure scheme for suppression of diffraction orders produced field-stitch errors in blazed diffraction gratings on non-flat substrates.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Daniel W. Wilson, Daniel W. Wilson, Richard E. Muller, Richard E. Muller, Pierre M. Echternach, Pierre M. Echternach, Johan P. Backlund, Johan P. Backlund, } "Electron-beam lithography for micro- and nano-optical applications", Proc. SPIE 5720, Micromachining Technology for Micro-Optics and Nano-Optics III, (22 January 2005); doi: 10.1117/12.600784; https://doi.org/10.1117/12.600784

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