22 January 2005 Fabrication of three-dimensional photonic crystals with multilayer photolithography
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Proceedings Volume 5720, Micromachining Technology for Micro-Optics and Nano-Optics III; (2005); doi: 10.1117/12.589139
Event: MOEMS-MEMS Micro and Nanofabrication, 2005, San Jose, California, United States
Abstract
We have developed a new approach for the fabrication of three-dimensional photonic crystals based on multi-layer photolithography. This method, which uses commercially available photoresist, allows parallel fabrication of three-dimensional photonic crystals, and possesses the flexibility to create a variety of different lattice arrangements and the freedom of arbitrary defect introduction. We describe in this work how this method is derived from mature two-dimensional photolithography and demonstrate it with the fabrication of multi-layer woodpile structures with and without defects as well as other unique three-dimensional microstructures.
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Peng Yao, Garrett J. Schneider, Binglin Miao, Dennis W. Prather, Eric D. Wetzel, Daniel J. O'Brien, "Fabrication of three-dimensional photonic crystals with multilayer photolithography", Proc. SPIE 5720, Micromachining Technology for Micro-Optics and Nano-Optics III, (22 January 2005); doi: 10.1117/12.589139; https://doi.org/10.1117/12.589139
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