22 January 2005 Fabrication of three-dimensional photonic crystals with multilayer photolithography
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We have developed a new approach for the fabrication of three-dimensional photonic crystals based on multi-layer photolithography. This method, which uses commercially available photoresist, allows parallel fabrication of three-dimensional photonic crystals, and possesses the flexibility to create a variety of different lattice arrangements and the freedom of arbitrary defect introduction. We describe in this work how this method is derived from mature two-dimensional photolithography and demonstrate it with the fabrication of multi-layer woodpile structures with and without defects as well as other unique three-dimensional microstructures.
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Peng Yao, Peng Yao, Garrett J. Schneider, Garrett J. Schneider, Binglin Miao, Binglin Miao, Dennis W. Prather, Dennis W. Prather, Eric D. Wetzel, Eric D. Wetzel, Daniel J. O'Brien, Daniel J. O'Brien, } "Fabrication of three-dimensional photonic crystals with multilayer photolithography", Proc. SPIE 5720, Micromachining Technology for Micro-Optics and Nano-Optics III, (22 January 2005); doi: 10.1117/12.589139; https://doi.org/10.1117/12.589139

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