22 January 2005 Multilayer coating method for x-ray reflectivity enhancement of polysilicon micro-mirrors at 1.54-Å wavelength
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Abstract
A poly-silicon piston micro-mirror array, which has been enhanced with a multilayer coating to exhibit special reflective properties at Cu Kα emission line of 1.54 Å is presented. The micro-mirror array is fabricated using the MEMSCAP PolyMUMPs process and packaged in a ceramic package. The packaged array is coated using atomic layer deposition with an Al2O3/W multilayer. The first Al2O3 layer is thicker than for a normal bilayer pair and prevents the mirror coating from creating an electrical short. This device was tested before and after coating. The snap-down voltage was reduced by half, but qualitatively the mechanical motion remained similar. The fabrication process presented for the Cu Kα wavelength at 1.54 Å can be easily adapted to other optical MEMS and for other wavelengths.
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Marie K. Tripp, Marie K. Tripp, Francois Fabreguette, Francois Fabreguette, Cari F. Herrmann, Cari F. Herrmann, Steven M. George, Steven M. George, Victor M. Bright, Victor M. Bright, } "Multilayer coating method for x-ray reflectivity enhancement of polysilicon micro-mirrors at 1.54-Å wavelength", Proc. SPIE 5720, Micromachining Technology for Micro-Optics and Nano-Optics III, (22 January 2005); doi: 10.1117/12.590429; https://doi.org/10.1117/12.590429
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