22 January 2005 Mechanical stability of spatial light modulators in microlithography
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Abstract
The Fraunhofer IPMS and Micronic Laser Systems AB have developed a technology for microlithography using spatial light modulation (SLM). This technology uses an array of micromirrors as a programmable mask, which allows parallel writing of 1 million pixels with a frame rate of up to 2 kHz. The SLM is fabricated at the IPMS using its high-voltage CMOS process. The mirrors are fabricated by surface micromachining using a polymer as sacrificial layer. The mirrors are operated in an analog mode to allow sub-pixel placement of pattern features. This paper describes the function of the SLM with an emphasis on the stability of the mirror deflection and a method to improve it which has been implemented.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ulrike A. Dauderstadt, Peter Duerr, Ulric B. Ljungblad, Tord Karlin, Harald Schenk, and Hubert Lakner "Mechanical stability of spatial light modulators in microlithography", Proc. SPIE 5721, MOEMS Display and Imaging Systems III, (22 January 2005); doi: 10.1117/12.590082; https://doi.org/10.1117/12.590082
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