13 April 2005 Mueller matrix ellipsometry of multilayer porous columnar thin films with applications to square spiral photonic crystals
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Proceedings Volume 5733, Photonic Crystal Materials and Devices III; (2005); doi: 10.1117/12.590921
Event: Integrated Optoelectronic Devices 2005, 2005, San Jose, California, United States
Abstract
In this paper, we present the growth and optical characterization of the preliminary stages of amorphous silicon square spiral growth on pre-patterned and unpatterned sections of silicon substrates. The periodicity of the seeding was set to 1 μm using electron beam lithography, and a seed enhancement layer was deposited on top of the seeds, followed by a quarter-turn square spiral on top of that. It was found that the optical constants in the wavelength region of 1000 nm to 1700 nm for the film materials were higher for the patterned sections of the film as compared with the unpatterned sections of the film.
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James Gospodyn, Mark A. Summers, Michael J. Brett, Jeremy C. Sit, "Mueller matrix ellipsometry of multilayer porous columnar thin films with applications to square spiral photonic crystals", Proc. SPIE 5733, Photonic Crystal Materials and Devices III, (13 April 2005); doi: 10.1117/12.590921; https://doi.org/10.1117/12.590921
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KEYWORDS
Thin films

Photonic crystals

Ellipsometry

Silicon

Electron beam lithography

Scanning electron microscopy

Data modeling

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