13 April 2005 Self-collimation in 3D photonic crystals
Author Affiliations +
Proceedings Volume 5733, Photonic Crystal Materials and Devices III; (2005); doi: 10.1117/12.587824
Event: Integrated Optoelectronic Devices 2005, 2005, San Jose, California, United States
Abstract
In this paper we present self-collimation in three-dimensional (3D) photonic crystals (PhCs) consisting of a simple cubic structure. By exploiting the dispersive properties of photonic crystals, a cubic-like shape equi-frequency surface (EFS) is obtained. Such surfaces allow for structureless confinement of light. Due to the degeneracy of propagation modes in a 3D structure, self-collimation modes can be distinguished from other modes by launching a source with a particular polarization. To this end, we found that polarization dependence is a key issue in 3D self-collimation. The results hold promise for high-density PhCs devices due to the lack of structural interaction. Finally, a novel method for the fabrication of three-dimensional (3D) simple cubic photonic crystal structures using conventional planar silicon micromachining technology is presented. The method utilizes a single planar etch mask coupled with time multiplexed sidewall passivation and deep anisotropic reactive ion etching in combination with isotropic etch processes to create three-dimensional photonic crystal devices. Initial experimental results are presented.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dennis W. Prather, Shouyuan Shi, Sriram Venkataraman, Zhaolin Lu, Janusz Murakowski, Garrett Schneider, "Self-collimation in 3D photonic crystals", Proc. SPIE 5733, Photonic Crystal Materials and Devices III, (13 April 2005); doi: 10.1117/12.587824; https://doi.org/10.1117/12.587824
PROCEEDINGS
10 PAGES


SHARE
KEYWORDS
Dispersion

Photonic crystals

Etching

Radio propagation

Photomasks

Silicon

Wave propagation

Back to Top