Nanoimprint technology and its applications

L. Jay Guo

doi:10.1117/12.597200

4 April 2005 Nanoimprint technology and its applications

L. Jay Guo

Proceedings Volume 5734, Quantum Dots, Nanoparticles, and Nanoclusters II; (2005) https://doi.org/10.1117/12.597200
Event: Integrated Optoelectronic Devices 2005, 2005, San Jose, California, United States

Abstract

The future of nanoscience and nanotechnology depends critically on the advance of micro- and nanofabrication technologies. Nanoimprint is an emerging lithographic technique that promises highthroughput patterning of nanostructures with simple equipmental setups. Based on the mechanical embossing principle, nanoimprint technique can achieve pattern resolutions beyond the limitations set by the light diffractions or beam scatterings in other conventional techniques. Nanoimprint can not only create resist patterns as in lithography, but can also imprint functional structures in polymers. This property can be exploited in many applications in the area of photonics and biotechnology. This article reviews basic principles of nanoimprint and some of the recent applications in this field.

Citation Download Citation

L. Jay Guo "Nanoimprint technology and its applications", Proc. SPIE 5734, Quantum Dots, Nanoparticles, and Nanoclusters II, (4 April 2005); https://doi.org/10.1117/12.597200

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