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4 April 2005 Nanoimprint technology and its applications
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Abstract
The future of nanoscience and nanotechnology depends critically on the advance of micro- and nanofabrication technologies. Nanoimprint is an emerging lithographic technique that promises highthroughput patterning of nanostructures with simple equipmental setups. Based on the mechanical embossing principle, nanoimprint technique can achieve pattern resolutions beyond the limitations set by the light diffractions or beam scatterings in other conventional techniques. Nanoimprint can not only create resist patterns as in lithography, but can also imprint functional structures in polymers. This property can be exploited in many applications in the area of photonics and biotechnology. This article reviews basic principles of nanoimprint and some of the recent applications in this field.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
L. Jay Guo "Nanoimprint technology and its applications", Proc. SPIE 5734, Quantum Dots, Nanoparticles, and Nanoclusters II, (4 April 2005); https://doi.org/10.1117/12.597200
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