Paper
7 March 2005 Effect of different n-electrode patterns on optical characteristics of large-area p-side down InGaN light-emitting diodes fabricated by laser lift-off
Jung-Tang Chu, Wen-Deng Liang, Chih-Chiang Kao, Hung-Wen Huang, Chen-Fu Chu, Hao-Chung Kuo, S. C. Wang
Author Affiliations +
Abstract
Large-area (1000×1000 μm2) p-side down InGaN light-emitting diodes (LEDs) have been fabricated by laser lift-off (LLO) technique. The p-side down LEDs with different geometric patterns of n-electrode were fabricated to investigate electrode pattern-dependent optical characteristics. Current crowding effect was first observed in in the p-side down InGaN LLO-LEDs. The LEDs with well designed n-electrode shows a uniform distribution of light-emitting pattern and higher out put power due to uniform current spreading and minimization of thermal effect. The output power saturation induced by current crowding in the LEDs with simplest geometric n-electrode was demonstrated. In absent of transparent contact layer for current spreading, the n-electrode pattern has remarkable influence on the current distribution and consequently the light output power of the large-area p-side down LEDs.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jung-Tang Chu, Wen-Deng Liang, Chih-Chiang Kao, Hung-Wen Huang, Chen-Fu Chu, Hao-Chung Kuo, and S. C. Wang "Effect of different n-electrode patterns on optical characteristics of large-area p-side down InGaN light-emitting diodes fabricated by laser lift-off", Proc. SPIE 5739, Light-Emitting Diodes: Research, Manufacturing, and Applications IX, (7 March 2005); https://doi.org/10.1117/12.583288
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KEYWORDS
Light emitting diodes

Electrodes

Gallium nitride

Copper

Indium gallium nitride

Laser liftoff

Sapphire

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