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6 May 2005 Apparatus for contamination control development in EUVA
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For the development of chemical contamination control of extreme ultraviolet (EUV) lithography, especially to prolong the lifetime of optical elements, we had established and installed the experimental apparatus on Super-ALIS, a synchrotron facility beam-line, at NTT Atsugi laboratory, Japan. The apparatus is constructed with ultra high vacuum (UHV) components, then it is achieved that the residual gas pressure less than 5x10-7 Pa with no significant hydrocarbon contaminants. Using the setup, radiation-induced oxide formation and/or carbon deposition on EUVL optics mirror can be evaluated by EUV light irradiations and in-situ measurements of the reflectance under specified partial pressure of contaminants. Sub-system to introduce and control of pressure of water vapor in the irradiation chamber between 1x10-6 and 1x10-2 Pa is available. Preliminary results about dependency to water vapor partial pressure and EUV light intensity/dose indicate that the tendency that higher degree of oxidation of Mo/Si multi-layered mirror (MLM) surface is obtained from longer irradiation time and higher ambient water vapor pressure, whereas the Ru-capped mirrors maintains negligible oxidation if water pressure is 1x10-6 Pa. Electron-beam (EB) irradiation sub-system was also mounted for the accelerated and off-line oxidation and/or carbon deposition/cleaning evaluation. Vacuum ultraviolet (VUV) light (Xe2 excimer lamp: 172nm) irradiation sub-system with oxygen introduction is also available. Significant cleaning effect is obtained while oxidation of multi-layer mirror surface was observed. Estimated cleaning rate under the oxygen pressure of 100 Pa for sputtered carbon film is about 0.03 nm/min.
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Takashi Aoki, Hiroyuki Kondo, Shuichi Matsunari, Hiromitsu Takase, Yoshio Gomei, and Shigeru Terashima "Apparatus for contamination control development in EUVA", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005);

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