Characterization of capped multilayer mirrors using XPS, AES, and SIMS

Hiromitsu Takase; Yoshio Gomei; Shigeru Terashima; Hiroyuki Kondo; Takashi Aoki; Shuichi Matsunari; Masahito Niibe; Yukinobu Kakutani

doi:10.1117/12.600452

6 May 2005 Characterization of capped multilayer mirrors using XPS, AES, and SIMS

Hiromitsu Takase, Yoshio Gomei, Shigeru Terashima, Hiroyuki Kondo, Takashi Aoki, Shuichi Matsunari, Masahito Niibe, Yukinobu Kakutani

Author Affiliations +

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.600452
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

The effect of extreme ultraviolet (EUV) exposure on the chemical states of ruthenium (Ru) capped multilayer mirrors (MLM) and Silicon (Si) capped MLM with increasing water pressure were investigated by using X-ray Photoelectron Spectroscopy (XPS). Also, The capability of analyzing carbon on the Ru capped MLM was investigated by using Auger Electron Spectroscopy (AES), XPS and Secondary Ion Mass Spectroscopy (SIMS). It was demonstrated that ruthenium oxide was produced on the surface by EUV exposure under water pressure more than 1x10^-5 Pa. The dependency of oxidation on water pressure of the Ru capped MLM was not noticeable in comparison with the Si capped MLM, while Mo was not oxidized even under 1x10^-3 Pa of water pressure. As for the analysis of carbon on Ru capped MLM, raising the precision of peak separation between carbon and Ru was required in AES and XPS and the investigation for quantification was needed in SIMS.

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Hiromitsu Takase, Yoshio Gomei, Shigeru Terashima, Hiroyuki Kondo, Takashi Aoki, Shuichi Matsunari, Masahito Niibe, and Yukinobu Kakutani "Characterization of capped multilayer mirrors using XPS, AES, and SIMS", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.600452

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