Electron beam direct write lithography flexibility for ASIC manufacturing: an opportunity for cost reduction

L. Pain; M. Jurdit; J. Todeschini; S. Manakli; B. Icard; B. Minghetti; G. Bervin; A. Beverina; F. Leverd; M. Broekaart; P. Gouraud; V. De Jonghe; Ph. Brun; S. Denorme; F. Boeuf; V. Wang; D. Henry

doi:10.1117/12.601498

6 May 2005 Electron beam direct write lithography flexibility for ASIC manufacturing: an opportunity for cost reduction (Keynote Paper)

L. Pain, M. Jurdit, J. Todeschini, S. Manakli, B. Icard, B. Minghetti, G. Bervin, A. Beverina, F. Leverd, M. Broekaart, P. Gouraud, V. De Jonghe, Ph. Brun, S. Denorme, F. Boeuf, V. Wang, D. Henry

Author Affiliations +

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.601498
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

With the strong increase of mask complexity and associated price for each new technology node, mask less lithography represents more and more an interesting and complementary alternative for ASIC manufacturing especially in the fields of low volume and leading eadge technology applications. In the semiconductor business where prices and cycle time are constantly pressured, the capability and flexibility of the electron beam direct write offer an effective real cost and cycle time opportunity thanks to its high-resolution capability but also to its ability to print, modify or correct design everywhere in a circuit. This paper highlights application examples where the advantages of this lithography solution are demonstrated for advanced research and development application with the patterning of 45 nm SRAM and for the fast validation of architecture designs. This work confirms that mask less lithography can be transparently placed into production environment, in association with the "golden" optical lithography reference.

Citation Download Citation

L. Pain, M. Jurdit, J. Todeschini, S. Manakli, B. Icard, B. Minghetti, G. Bervin, A. Beverina, F. Leverd, M. Broekaart, P. Gouraud, V. De Jonghe, Ph. Brun, S. Denorme, F. Boeuf, V. Wang, and D. Henry "Electron beam direct write lithography flexibility for ASIC manufacturing: an opportunity for cost reduction (Keynote Paper)", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.601498

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