6 May 2005 High-power and high-repetition-rate EUV source based on Xe discharge-produced plasma
Author Affiliations +
Discharge-produced plasma (DPP) based EUV source have been studied and developed at EUVA/Gotenba Branch. Among the several kinds of discharge scheme, a capillary Z-pinch has been employed in our source. An all-solid-state magnetic pulse compression (MPC) generator was used to create a Z-pinch plasma. Low inductance MPC generator provides a pulsed current with about 52 kA of peak amplitude and 120 ns of pulse duration, and allows 7-kHz operation. A water-cooled discharge head was coupled with the MPC generator. In order to evaluate the source performance, electrical energy input to the discharge, EUV radiation power, radiation spatial profile, plasma image and spectra were observed. In-band EUV power into usable solid angle obtained at 7 kHz was 93 W/2%BW. By using nested grazing-incidence collector, EUV power at intermediate focus obtained was 19 W/2%BW.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yusuke Teramoto, Yusuke Teramoto, Hiroto Sato, Hiroto Sato, Kazunori Bessho, Kazunori Bessho, Gohta Niimi, Gohta Niimi, Takahiro Shirai, Takahiro Shirai, Daiki Yamatani, Daiki Yamatani, Tetsu Takemura, Tetsu Takemura, Toshio Yokota, Toshio Yokota, Khokan C. Paul, Khokan C. Paul, Kiyoyuki Kabuki, Kiyoyuki Kabuki, Koji Miyauchi, Koji Miyauchi, Mitsuru Ikeuchi, Mitsuru Ikeuchi, Kazuaki Hotta, Kazuaki Hotta, Masaki Yoshioka, Masaki Yoshioka, Koichi Toyoda, Koichi Toyoda, "High-power and high-repetition-rate EUV source based on Xe discharge-produced plasma", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.602021; https://doi.org/10.1117/12.602021

Back to Top