High-resolution EUV imaging tools for resist exposure and aerial image monitoring

M. Booth; O. Brisco; A. Brunton; J. Cashmore; P Elbourn; G. Elliner; M. Gower; J. Greuters; P. Grunewald; R. Gutierrez; T. Hill; J. Hirsch; L. Kling; N. McEntee; S. Mundair; P. Richards; V. Truffert; I. Wallhead; M. Whitfield; R. Hudyma

doi:10.1117/12.606715

6 May 2005 High-resolution EUV imaging tools for resist exposure and aerial image monitoring

M. Booth, O. Brisco, A. Brunton, J. Cashmore, P Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grunewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, R. Hudyma

Author Affiliations +

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.606715
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Key features are presented of two high-resolution EUV imaging tools: the MS-13 Microstepper wafer exposure and the RIM-13 reticle imaging microscope. The MS-13 has been developed for EUV resist testing and technology evaluation at the 32nm node and beyond, while the RIM-13 is designed for actinic aerial image monitoring of blank and patterned EUV reticles. Details of the design architecture, module layout, major subsystems and performance are presented for both tools.

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M. Booth, O. Brisco, A. Brunton, J. Cashmore, P Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grunewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma "High-resolution EUV imaging tools for resist exposure and aerial image monitoring", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.606715

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