6 May 2005 Integrating Philips' extreme UV source in the alpha-tools
Author Affiliations +
Abstract
The paper describes recent progress in the development of the Philips's EUV source. Progress has been realized at many frontiers: Integration studies of the source into a scanner have primarily been studied on the Xe source because it has a high degree of maturity. We report on integration with a collector, associated collector lifetime and optical characteristics. Collector lifetime in excess of 1 bln shots could be demonstrated. Next, an active dose control system was developed and tested on the Xe lamp. Resulting dose stability data are less than 0.2% for an exposure window of 100 pulses. The second part of the paper reports on progress in the development of the Philips' Sn source. First, the details of the concept are described. It is based on a Laser triggered vacuum arc, which is an extension with respect to previous designs. The source is furbished with rotating electrodes that are covered with a Sn film that is constantly regenerated. Hence by the very design of the source, it is scalable to very high power levels, and moreover has fundamentally solved the notorious problem of electrode erosion. Power values of 260 W in 2p sr are reported, along with a stable, long life operation of the lamp. The paper also addresses the problem of debris generation and mitigation of the Sn-source. The problem is attacked by a combined strategy of protection of the collector by traditional means (e.g. fields, foiltraps... ), and by designing the gas atmosphere according to the principles of the well known halogen cycles in incandescent lamps. These principles have been studied in the Lighting industry for decades and rely on the excessively high vapor pressures of metal halides. Transferred to the Sn source, it allows pumping away tin residues that would otherwise irreversibly deposit on the collector.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joseph Pankert, Joseph Pankert, Rolf Apetz, Rolf Apetz, Klaus Bergmann, Klaus Bergmann, Guenther Derra, Guenther Derra, Maurice Janssen, Maurice Janssen, Jeroen Jonkers, Jeroen Jonkers, Jurgen Klein, Jurgen Klein, Thomas Kruecken, Thomas Kruecken, Andreas List, Andreas List, Michael Loeken, Michael Loeken, Christof Metzmacher, Christof Metzmacher, Willi Neff, Willi Neff, Sven Probst, Sven Probst, Ralph Prummer, Ralph Prummer, Oliver Rosier, Oliver Rosier, Stefan Seiwert, Stefan Seiwert, Guido Siemons, Guido Siemons, Dominik Vaudrevange, Dominik Vaudrevange, Dirk Wagemann, Dirk Wagemann, Achim Weber, Achim Weber, Peter Zink, Peter Zink, Oliver Zitzen, Oliver Zitzen, } "Integrating Philips' extreme UV source in the alpha-tools", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.598650; https://doi.org/10.1117/12.598650
PROCEEDINGS
12 PAGES


SHARE
RELATED CONTENT

Status of DPP EUV sources development for Beta/HVM
Proceedings of SPIE (December 03 2008)
EUV lithography: main challenges
Proceedings of SPIE (May 27 2004)
Status of Philips' extreme UV source
Proceedings of SPIE (May 19 2004)
EUV sources for the alpha-tools
Proceedings of SPIE (March 22 2006)
Development of Sn fueled high power DPP EUV source for...
Proceedings of SPIE (March 20 2007)

Back to Top