LPP EUV conversion efficiency optimization

J. R. Hoffman; A. N. Bykanov; O. V. Khodykin; A. I. Ershov; I. V. Fomenkov; W. N. Partlo; D. W. Myers

doi:10.1117/12.601048

6 May 2005 LPP EUV conversion efficiency optimization

J. R. Hoffman, A. N. Bykanov, O. V. Khodykin, A. I. Ershov, I. V. Fomenkov, W. N. Partlo, D. W. Myers

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.601048
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Efficient conversion of laser light into EUV radiation is one of the most important problems of the laser-produced plasma (LPP) EUV source. Too low a conversion efficiency (CE) increases the amount of power the drive laser will have to deliver, which, besides the obvious laser cost increase, also increases the thermal load on all the components and can lead to increased debris generation. In order to meet the requirements for a high-volume manufacturing (HVM) tool and at the same time keep the laser power requirements within acceptable limits, a CE exceeding 2.5% is likely to be required. We present our results on optimizing conversion efficiency of LPP EUV generation. The optimization parameters include laser wavelength, target material, and laser pulse shape, energy and intensity. The final choice between parameter sets that leads to the required minimum CE is dependent on the debris mitigation solutions and the laser source available for a particular parameter set.

Citation Download Citation

J. R. Hoffman, A. N. Bykanov, O. V. Khodykin, A. I. Ershov, I. V. Fomenkov, W. N. Partlo, and D. W. Myers "LPP EUV conversion efficiency optimization", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.601048

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