Laser-produced-plasma light source for EUV lithography

Georg Soumagne; Tamotsu Abe; Takashi Suganuma; Yousuke Imai; Hiroshi Someya; Hideo Hoshino; Masaki Nakano; Hiroshi Komori; Yuichi Takabayashi; Tatsuya Ariga; Yoshifumi Ueno; Yasunori Wada; Akira Endo; Koichi Toyoda

doi:10.1117/12.599333

6 May 2005 Laser-produced-plasma light source for EUV lithography

Georg Soumagne, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Hiroshi Komori, Yuichi Takabayashi, Tatsuya Ariga, Yoshifumi Ueno, Yasunori Wada, Akira Endo, Koichi Toyoda

Author Affiliations +

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.599333
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

The status of the next generation lithography laser produced plasma light source development at EUVA is presented. The light source is based on a Xenon jet target and a Nd:YAG driver laser. The laser, having a master oscillator power amplifier (MOPA) configuration, operates at 10 kHz repetition rate and generates an average output power of 1.5 kW. The fwhm pulsewidth is 6 ns. The EUV system currently delivers an average EUV source power of 9.1 W (2% bandwidth, 2π sr) with a conversion efficiency of 0.6 %. Based on the development it is concluded that solid-state Nd:YAG laser technology can be cost efficiently used to produce 10 W level EUV light sources. In order to generate an average power of 115 W for a future extreme ultraviolet (EUV) light source, however, the cost of a Nd:YAG based LPP source will be too high. Therefore RF-CO₂ laser technology will be used. The designed CO₂ driver laser system has a MOPA configuration. The oscillator has ns-order pulsewidth and the laser system operates at a repetition rate of 100 kHz. Due to its inert cleanliness Xenon droplets will be the target material.

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Georg Soumagne, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Hiroshi Komori, Yuichi Takabayashi, Tatsuya Ariga, Yoshifumi Ueno, Yasunori Wada, Akira Endo, and Koichi Toyoda "Laser-produced-plasma light source for EUV lithography", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.599333

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