6 May 2005 Modeling of the atomic processes in the laser-plasma EUV sources
Author Affiliations +
We develop an atomic model for the Xe and Sn plasmas based on the calculated atomic data for the theoretical investigatiion of the laser plasma EUV source. The wavelength and intensity of the emission lines of Xe8-16+ and Sn4-12+ are investigated, and the dominant charge state and emission channels for the radiation at 13.5 nm are identified. The emissivity and opacity at the collisional radiative equilibrium (CRE) are calculated, and their spectral properties are investigated with respect to the accuracy of the wavelength of major emission lines and the effect of satellite lines.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. Sasaki, A. Sasaki, K. Nishihara, K. Nishihara, F. Koike, F. Koike, K. Kagawa, K. Kagawa, H. Tanuma, H. Tanuma, A. Sunahara, A. Sunahara, K. Gamada, K. Gamada, T. Nishikawa, T. Nishikawa, } "Modeling of the atomic processes in the laser-plasma EUV sources", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.602029; https://doi.org/10.1117/12.602029


Back to Top