6 May 2005 Perfluoropolyethers as novel materials for soft lithography
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Abstract
Photocurable, liquid perfluoropolyethers (PFPEs) are ideal materials for high resolution (<100 nm) pattern transfer and imprint lithographic processes. PFPEs possess attributes of both elastomers and rigid materials, exhibit a remarkably low surface energy, mold extremely small features with high fidelity (minimal shrinkage), resist swelling by most organics, endure repetitive molding procedures, and out-perform routinely-used polydimethylsiloxane when replicating sub-micron sized features. We report nanoscale replicas of substrates, and the use of these replicas as molds, having features as small as 70 nm with no apparent loss of resolution.
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Jason P. Rolland, Jason P. Rolland, Eric C. Hagberg, Eric C. Hagberg, Kenneth R. Carter, Kenneth R. Carter, Joseph M. DeSimone, Joseph M. DeSimone, } "Perfluoropolyethers as novel materials for soft lithography", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.598849; https://doi.org/10.1117/12.598849
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