Proof-of-concept tool development for projection mask-less lithography (PML2)

Hans-Joachim Doering; Thomas Elster; Joachim Heinitz; Olaf Fortagne; Christoph Brandstaetter; Ernst Haugeneder; Stefan Eder-Kapl; Gertraud Lammer; Hans Loeschner; Klaus Reimer; Joerg Eichholz; Juergen Saniter

doi:10.1117/12.600458

6 May 2005 Proof-of-concept tool development for projection mask-less lithography (PML2)

Hans-Joachim Doering, Thomas Elster, Joachim Heinitz, Olaf Fortagne, Christoph Brandstaetter, Ernst Haugeneder, Stefan Eder-Kapl, Gertraud Lammer, Hans Loeschner, Klaus Reimer, Joerg Eichholz, Juergen Saniter

Author Affiliations +

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.600458
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Electron beam based Projection Mask-Less Lithography (PML2) is one of the promising candidates for small and medium volume device production for the 45nm technology node and beyond. The concept of the PML2 proof-of-concept tool, to be realized as part of the European MEDEA+ project T409, comprises a single electron optical column, a multi beam blanking device (programmable "Aperture Plate System") including high speed optical data path and a scanning 300mm wafer stage. More than 250.000 beams will be projected onto the wafer used for a highly redundant scanning stripe exposure process. A demonstrator chip of the Aperture Plate System is being manufactured with > 1000 apertures of 5μm x 5μm size using standard MST processes. Results as achieved with this demonstrator chip using a specifically designed e-beam test bench are shown. Furthermore, the realtime data transmission concept is discussed, showing that with the selected technology the required data rates for the PML2 proof-of-concept tool can be delivered, with extendibility beyond. Viability of the optical data pattern transfer to the Aperture Plate System is shown using a test setup of the parallel high-speed transmission lines.

Citation Download Citation

Hans-Joachim Doering, Thomas Elster, Joachim Heinitz, Olaf Fortagne, Christoph Brandstaetter, Ernst Haugeneder, Stefan Eder-Kapl, Gertraud Lammer, Hans Loeschner, Klaus Reimer, Joerg Eichholz, and Juergen Saniter "Proof-of-concept tool development for projection mask-less lithography (PML2)", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.600458

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available