6 May 2005 Status of EUV reflectometry at PTB
Author Affiliations +
Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005); doi: 10.1117/12.598728
Event: Microlithography 2005, 2005, San Jose, California, United States
Abstract
The development of EUV lithography is critically based on the availability of suitable metrological equipment. To meet the industry's requirements, the Physikalisch-Technische Bundesanstalt (PTB) operates an EUV reflectometry facility at the electron storage ring BESSY II. It is designed for at-wavelength metrology of full-sized EUVL optics with a maximum weight of 50 kg and a diameter of up to 550 mm. A micro-reflectometry station was installed for reflectometry with high spatial resolution for, e.g., structured masks. A photon beam size of 10 μm FWHM has presently been achieved. To meet the increasing demands of metrology for future lithography production tools, the measurement uncertainty was permanently reduced. For peak reflectance, a total uncertainty of 0.10 % is achieved with a reproducibility of 0.05 %. The uncertainty of 2 pm in the center wavelength is given mainly by the uncertainty for the reference wavelength of the Kr 3d5/2-5p resonance. A long-term reproducibility of 0.8 pm has been demonstrated over a period of about 4 years. We have recently demonstrated repeatability below 0.06 pm. This good repeatability is important for the determination of the coating-thickness gradient in alpha-tool optics. We present a long-term series of measurements at a set of EUV mirrors and discuss our recent results in improving wavelength reproducibility.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Frank Scholze, Christian Laubis, Christian Buchholz, Andreas Fischer, Sven Ploeger, Frank Scholz, Heike Wagner, Gerhard Ulm, "Status of EUV reflectometry at PTB", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.598728; https://doi.org/10.1117/12.598728
PROCEEDINGS
10 PAGES


SHARE
KEYWORDS
Mirrors

Reflectivity

Extreme ultraviolet

Reflectometry

Sensors

Extreme ultraviolet lithography

Multilayers

Back to Top