6 May 2005 UIUC collector erosion and optical lifetime project results: time dependent exposures
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Abstract
Extreme ultraviolet (EUV) light sources are needed for next-generation lithography. A critical consideration in the development of such a source is the lifetime of collector optics. Frequent replacement of the mirror system will detract from the economic feasibility of EUV lithography. The Xtreme Commercial EUV Exposure Device (XCEED) at the University of Illinois has been designed to test the performance of various EUV mirror materials during operation of a commercial EUV source, and to investigate the mechanisms behind observed losses in reflectivity over a varying number of shots. Recently, four Mo/Si multilayer mirror samples were exposed in XCEED for variable numbers of shots, up to 40 million. The samples were analyzed to determine how the surface roughness was effected and how much material was eroded vs. time. XCEED also includes photodiodes to measure light output and light reflected from mirror samples, as well as a time-of-flight energy sector analyzer (TOF-ESA) for debris characterization. The results of these time-dependent exposures are presented in this work.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Darren A. Alman, Huatan Qiu, Keith C. Thompson, Erik L. Antonsen, Joshua B. Spencer, Matthew R. Hendricks, Brian E. Jurczyk, David N. Ruzic, Timothy Spila, Ginger Edwards, Stefan Wurm, Obert Wood, Robert Bristol, "UIUC collector erosion and optical lifetime project results: time dependent exposures", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.599978; https://doi.org/10.1117/12.599978
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