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Immersion scatterometry for improved feature resolution and high speed acquisition of resist profiles
Comparison of scatterometry, atomic force microscope, dual beam system, and XSEM to measure etched via depths
Specifications, methodologies, and results of evaluation of optical critical dimension scatterometer tools at the 90nm CMOS technology node and beyond
Qualification of an integrated scatterometer for CD measurements of sub-100nm resist structures in a high-volume 300mm DRAM production environment