Experimental comparison of absolute PDI and lateral shearing interferometer

Yucong Zhu; Katsumi Sugisaki; Masashi Okada; Katsura Otaki; Zhiqian Liu; Mikihiko Ishii; Jun Kawakami; Jun Saito; Katsuhiko Murakami; Chidane Ouchi; Masanobu Hasegawa; Seima Kato; Takayuki Hasegawa; Akiyoshi Suzuki; Masahito Niibe

doi:10.1117/12.600274

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10 May 2005 Experimental comparison of absolute PDI and lateral shearing interferometer

Yucong Zhu, Katsumi Sugisaki, Masashi Okada, Katsura Otaki, Zhiqian Liu, Mikihiko Ishii, Jun Kawakami, Jun Saito, Katsuhiko Murakami, Chidane Ouchi, Masanobu Hasegawa, Seima Kato, Takayuki Hasegawa, Akiyoshi Suzuki, Masahito Niibe

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Proceedings Volume 5752, Metrology, Inspection, and Process Control for Microlithography XIX; (2005) https://doi.org/10.1117/12.600274
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

We present the experimental results of EUVA Absolute Point Diffraction Interferometer (ABSPDI) and Lateral Shearing Interferometer (LSI) for at-wavelength characterization of the projection lens for use in extreme-ultraviolet lithography (EUVL). The attained repeatability of either type of the interferometers is within 0.04nmRMS. The experimental results have shown good consistency between the LSI and ABSPDI. The reasons for the residual differences have been analyzed and we believed it is mainly due to the CCD tilt effect in the experimental system. After the CCD tilt effect was removed, a better consistency below 0.33nm RMS has been achieved.

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Yucong Zhu, Katsumi Sugisaki, Masashi Okada, Katsura Otaki, Zhiqian Liu, Mikihiko Ishii, Jun Kawakami, Jun Saito, Katsuhiko Murakami, Chidane Ouchi, Masanobu Hasegawa, Seima Kato, Takayuki Hasegawa, Akiyoshi Suzuki, and Masahito Niibe "Experimental comparison of absolute PDI and lateral shearing interferometer", Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); https://doi.org/10.1117/12.600274

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