Experimental comparison of absolute PDI and lateral shearing interferometer

Yucong Zhu; Katsumi Sugisaki; Masashi Okada; Katsura Otaki; Zhiqian Liu; Mikihiko Ishii; Jun Kawakami; Jun Saito; Katsuhiko Murakami; Chidane Ouchi; Masanobu Hasegawa; Seima Kato; Takayuki Hasegawa; Akiyoshi Suzuki; Masahito Niibe

doi:10.1117/12.600274

10 May 2005 Experimental comparison of absolute PDI and lateral shearing interferometer

Yucong Zhu; Katsumi Sugisaki; Masashi Okada; Katsura Otaki; Zhiqian Liu; Mikihiko Ishii; Jun Kawakami; Jun Saito; Katsuhiko Murakami; Chidane Ouchi; Masanobu Hasegawa; Seima Kato; Takayuki Hasegawa; Akiyoshi Suzuki; Masahito Niibe

Author Affiliations +

Proceedings Volume 5752, Metrology, Inspection, and Process Control for Microlithography XIX; (2005) https://doi.org/10.1117/12.600274
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

We present the experimental results of EUVA Absolute Point Diffraction Interferometer (ABSPDI) and Lateral Shearing Interferometer (LSI) for at-wavelength characterization of the projection lens for use in extreme-ultraviolet lithography (EUVL). The attained repeatability of either type of the interferometers is within 0.04nmRMS. The experimental results have shown good consistency between the LSI and ABSPDI. The reasons for the residual differences have been analyzed and we believed it is mainly due to the CCD tilt effect in the experimental system. After the CCD tilt effect was removed, a better consistency below 0.33nm RMS has been achieved.

Citation Download Citation

Yucong Zhu, Yucong Zhu, Katsumi Sugisaki, Katsumi Sugisaki, Masashi Okada, Masashi Okada, Katsura Otaki, Katsura Otaki, Zhiqian Liu, Zhiqian Liu, Mikihiko Ishii, Mikihiko Ishii, Jun Kawakami, Jun Kawakami, Jun Saito, Jun Saito, Katsuhiko Murakami, Katsuhiko Murakami, Chidane Ouchi, Chidane Ouchi, Masanobu Hasegawa, Masanobu Hasegawa, Seima Kato, Seima Kato, Takayuki Hasegawa, Takayuki Hasegawa, Akiyoshi Suzuki, Akiyoshi Suzuki, Masahito Niibe, Masahito Niibe, } "Experimental comparison of absolute PDI and lateral shearing interferometer", Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); doi: 10.1117/12.600274; https://doi.org/10.1117/12.600274

ACCESS THE FULL ARTICLE

PERSONAL SIGN IN
Full access may be available with your subscription

Email or Username Forgot your username?

Password Forgot your password?

Show

Remember Email/Username on this computer

Remember Password

No SPIE account? Create an account
or Institutional Sign In via Shibboleth

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $14.40

Non-members: $18.00 ADD TO CART

Show All Keywords

Keywords/Phrases

Search In:

Publication Years