10 May 2005 Experimental comparison of absolute PDI and lateral shearing interferometer
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Abstract
We present the experimental results of EUVA Absolute Point Diffraction Interferometer (ABSPDI) and Lateral Shearing Interferometer (LSI) for at-wavelength characterization of the projection lens for use in extreme-ultraviolet lithography (EUVL). The attained repeatability of either type of the interferometers is within 0.04nmRMS. The experimental results have shown good consistency between the LSI and ABSPDI. The reasons for the residual differences have been analyzed and we believed it is mainly due to the CCD tilt effect in the experimental system. After the CCD tilt effect was removed, a better consistency below 0.33nm RMS has been achieved.
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Yucong Zhu, Yucong Zhu, Katsumi Sugisaki, Katsumi Sugisaki, Masashi Okada, Masashi Okada, Katsura Otaki, Katsura Otaki, Zhiqian Liu, Zhiqian Liu, Mikihiko Ishii, Mikihiko Ishii, Jun Kawakami, Jun Kawakami, Jun Saito, Jun Saito, Katsuhiko Murakami, Katsuhiko Murakami, Chidane Ouchi, Chidane Ouchi, Masanobu Hasegawa, Masanobu Hasegawa, Seima Kato, Seima Kato, Takayuki Hasegawa, Takayuki Hasegawa, Akiyoshi Suzuki, Akiyoshi Suzuki, Masahito Niibe, Masahito Niibe, } "Experimental comparison of absolute PDI and lateral shearing interferometer", Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); doi: 10.1117/12.600274; https://doi.org/10.1117/12.600274
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