Novel CD-SEM calibration reference patterned by EB cell projection lithography

Yoshinori Nakayama; Satoshi Gonda; Ichiko Misumi; Tomizo Kurosawa; Jun-ichiro Kitta; Hisaichi Mine; Katsuhiro Sasada; Shozo Yoneda; Takeshi Mizuno

doi:10.1117/12.597165

10 May 2005 Novel CD-SEM calibration reference patterned by EB cell projection lithography

Yoshinori Nakayama, Satoshi Gonda, Ichiko Misumi, Tomizo Kurosawa, Jun-ichiro Kitta, Hisaichi Mine, Katsuhiro Sasada, Shozo Yoneda, Takeshi Mizuno

Author Affiliations +

Proceedings Volume 5752, Metrology, Inspection, and Process Control for Microlithography XIX; (2005) https://doi.org/10.1117/12.597165
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

A silicon grating pattern with a 100-nm pitch size for calibration of electron-beam (EB) metrology systems was formed by EB cell projection writing using a grating stencil mask and dry etching. According to the evaluation results from a critical-dimension scanning electron microscope (CD-SEM), the uniformity of the pitch size in a 1.8 x 1.8-mm chip was smaller than 3 nm within 3 sigma in the x and y directions. The obtained 100-nm pitch size was calibrated by DUV laser diffraction. The difference between designed 100-nm pitch size and the calibrated pitch size by DUV laser diffraction was smaller than 0.1 nm. It is thus concluded that more precise calibration of the CD-SEM using this 100-nm pitch grating is expected compared with conventional calibration using 240-nm pitch reference grating fabricated by laser-interferometer lithography and anisotropic chemical etching.

Citation Download Citation

Yoshinori Nakayama, Satoshi Gonda, Ichiko Misumi, Tomizo Kurosawa, Jun-ichiro Kitta, Hisaichi Mine, Katsuhiro Sasada, Shozo Yoneda, and Takeshi Mizuno "Novel CD-SEM calibration reference patterned by EB cell projection lithography", Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); https://doi.org/10.1117/12.597165

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