Specifications, methodologies, and results of evaluation of optical critical dimension scatterometer tools at the 90nm CMOS technology node and beyond

Benjamin D. Bunday; Amy Peterson; John A. Allgair

doi:10.1117/12.600115

10 May 2005 Specifications, methodologies, and results of evaluation of optical critical dimension scatterometer tools at the 90nm CMOS technology node and beyond

Benjamin D. Bunday, Amy Peterson, John A. Allgair

Author Affiliations +

Proceedings Volume 5752, Metrology, Inspection, and Process Control for Microlithography XIX; (2005) https://doi.org/10.1117/12.600115
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

The Advanced Metrology Advisory Group (AMAG) is a council composed of the chief CD-metrologists from the SEMATECH consortium's Member Companies and from the National Institute of Standards (NIST). The AMAG wrote, with OCD tool supplier involvement, the "Unified Advanced Optical Critical Dimension (OCD) Scatterometer Specification for Sub-90nm Technology (2004 Version)" [22] to be a living document which outlines the required performance of OCD tools for supplier compliance to the 2003 International Technology Roadmap for Semiconductors (ITRS) and which conveys Sematech member companies' collective needs to vendors. Using this specification, evaluation efforts of currently available tools are being performed. The 2004 AMAG Unified Specification for Scatterometry includes sections outlining the test methodologies, metrics, and wafer-target requirements for each parameter to be benchmarked, and, if applicable, prescribes a target specification compatible with the ITRS. The methodologies are valid for the demands of the 90nm technology node and beyond. Parameters to be considered include: Precision, Repeatability and Reproducibility Accuracy System Matching Noise and Spectral Sensitivity Throughput Interaction with sample Measurement of material optical properties (n & k) Pattern recognition/stage navigation accuracy Specular Beam Width ("spot size") Cost of ownership (COO) When possible, the metrics in this specification have been made compatible with similar specifications in the AMAG CD-SEM Unified Specification so that fair intercomparisons of different tools can be made. Previous CD-SEM studies under this same project have been published, with the initial version of the International SEMATECH CD-SEM Unified Specification in 1998, and multi-supplier CD-SEM benchmarks in 1999, 2001 and 2003.

Citation Download Citation

Benjamin D. Bunday, Amy Peterson, and John A. Allgair "Specifications, methodologies, and results of evaluation of optical critical dimension scatterometer tools at the 90nm CMOS technology node and beyond", Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); https://doi.org/10.1117/12.600115

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available