PROCEEDINGS VOLUME 5753
MICROLITHOGRAPHY 2005 | 27 FEBRUARY - 4 MARCH 2005
Advances in Resist Technology and Processing XXII
Editor Affiliations +
MICROLITHOGRAPHY 2005
27 February - 4 March 2005
San Jose, California, United States
Invited Session: Future Challenges for Lithographic Materials
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.607235
Materials for Immersion Lithography I
Takashi Miyamatsu, Yong Wang, Motoyuki Shima, Shiro Kusumoto, Takashi Chiba, Hiroki Nakagawa, Katsuhiko Hieda, Tsutomu Shimokawa
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599165
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598532
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599746
Materials for Immersion Lithography II
Shinichi Kanna, Haruki Inabe, Kei Yamamoto, Shinji Tarutani, Hiromi Kanda, Kazuyoshi Mizutani, Kazuyuki Kitada, Seiji Uno, Yasumasa Kawabe
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600490
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.601621
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.601482
Francis Houlihan, Wookyu Kim, Raj Sakamuri, Keino Hamilton, Alla Dimerli, David Abdallah, Andrew Romano, Ralph R. Dammel, Georg Pawlowski, et al.
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.601768
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600782
Hiromitsu Tsuji, Masaaki Yoshida, Keita Ishizuka, Tomoyuki Hirano, Kotaro Endo, Mitsuru Sato
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599485
157-nm/193-nm Materials
Hiroshi Ito, Hoa D. Truong, Sean D. Burns, Dirk Pfeiffer, Wu-Song Huang, Mahmoud M. Khojasteh, P. Rao Varanasi, Mike Lercel
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598847
Toshiaki Fukuhara, Taku Hirayama, Yuji Shibasaki, Shinji Ando, Mitsuru Ueda, Masayuki Endo, Masaru Sasago
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598342
Pushkara Rao Varanasi, Ranee W. Kwong, Mahmoud Khojasteh, Kaushal Patel, Kuang-Jung Chen, Wenjie Li, M. C. Lawson, Robert D. Allen, Ratnam Sooriyakumaran, et al.
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599700
Toshikage Asakura, Hitoshi Yamato, Tobias Hintermann, Masaki Ohwa
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600327
Larry F. Rhodes, Chun Chang, Cheryl Burns, Dennis A. Barnes, Brian Bennett, Larry Seger, Xiaoming Wu, Andy Sobek, Mike Mishak, et al.
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600051
157-nm/193-nm Resist Processing I
Jung Hwan Hah, Subramanya Mayya, Mitsuhiro Hata, Hyun-Woo Kim, Man-Hyoung Ryoo, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon, Byung-Il Ryu
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599450
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599651
Geunsu Lee, Jungwoo Park, Wonwook Lee, Cheolkyu Bok, Changmoon Lim, Sungchan Moon
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598592
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.597709
Richard Peters, Patrick Montgomery, Cesar Garza, Stanley Filipiak, Tab Stephens, Dan Babbitt
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599918
Takayoshi Abe, Tooru Kimura, Takashi Chiba, Motoyuki Shima, Shiro Kusumoto, Tsutomu Shimokawa
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598960
157-nm/193-nm Resist Processing II
Mitsuhiro Hata, Jung-Hwan Hah, Hyun-Woo Kim, Man-Hyoung Ryoo, Sang-Gyun Woo, Han-Ku Cho
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599468
Tomoyuki Takeishi, K. Hayasaki, Tsuyoshi Shibata
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599192
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599348
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598819
Peng Zhang, Madhukar B. Rao, Manuel Jaramillo Jr., Bridget Horvath, Brenda Ross, Ted Paxton, Todd Davis, Pat Cook, David Witko
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600066
Resist Fundamentals I
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598822
David Van Steenwinckel, Jeroen H. Lammers, L. H. A. Leunissen, J. A. J. M. Kwinten
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598677
Theodore H. Fedynyshyn, Roger F. Sinta, Indira Pottebaum, Alberto Cabral
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600777
Vivek M. Prabhu, Bryan D. Vogt, Wen-Li Wu, Jack F. Douglas, Eric K. Lin, Sushil K. Satija, Dario L. Goldfarb, Hiroshi Ito
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598956
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599279
G. M. Wallraff, D. R. Medeiros, C. E. Larson, M. Sanchez, Karen Petrillo, Wu-Song Huang, C. Rettner, B. W. Davis, Linda Sundberg, et al.
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.601759
Resist Fundamentals II
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600100
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600615
Seiji Nagahara, Lei Yuan, Wojtek Jacob Poppe, Andrew Neureuther, Yoshiyuki Kono, Atsushi Sekiguchi, Koichi Fujiwara, Tsuyoshi (Gary) Watanabe, Kazuo Taira, et al.
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598949
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599736
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600150
Line-Edge Roughness
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599848
Arpan P. Mahorowala, Kuang-Jung Chen, Ratnam Sooriyakumaran, Aleksandra Clancy, Dakshi Murthy, Stacy Rasgon
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600043
Geunsu Lee, Tae-Seung Eom, Cheolkyu Bok, Changmoon Lim, Seung-Chan Moon, Jinwoong Kim
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599239
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599209
J. Todeschini, Laurent Pain, S. Manakli, B. Icard, V. DeJonghe, B. Minghetti, M. Jurdit, D. Henry, V. Wang
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.601616
ARC/EUV
Willie Perez, Stephen Turner, Nick Brakensiek, Lynne Mills, Larry Wilson, Paul Popa
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598765
Bo Li, Kim Do, Jason Stuck, Songyuan Xie, Roger Leung, Tiffany Nguyen, Jaswinder Gill, Lei Jin, Wenya Fan, et al.
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600015
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600214
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.597308
Novel Processing
Ashwini Sinha, Dennis W. Hess, Clifford L. Henderson
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598856
Novel Materials/Applications
Thomas J. Markley, Scott J. Weigel, Chris P. Kretz
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599989
Novel Processing
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.601012
Medhat A. Toukhy, Ping-Hung Lu, Salem K. Mullen
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.602636
Immersion Lithography Materials Challenges
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600560
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599280
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599643
Kwangjoo Lee, Joy Kunjappu, Steffen Jockusch, Nicholas J. Turro, Tatjana Widerschpan, Jianming Zhou, Bruce W. Smith, Paul Zimmerman, Will Conley
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.606105
Poster Session/157-nm Materials
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599162
T. Yamashita, T. Ishikawa, T. Yoshida, T. Hayamai, Takayuki Araki, H. Aoyama, T. Hagiwara, Toshiro Itani, Kiyoshi Fujii
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599523
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.601811
193-nm Materials
Ichiki Takemoto, Youngjoon Lee, Yusuke Fuji, Isao Yoshida, Kazuhiko Hashimoto, Takayuki Miyagawa, Satoshi Yamaguchi, Kenji Takahashi, Shinji Konishi
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.597135
Seung Duk Cho, Hyun Sang Joo, Dong Chul Seo, Ji Young Song, Kyoung Mun Kim, Joo Hyeon Park, Jae Chang Jung, Sung Koo Lee, Cheol Kyu Bok, et al.
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599443
Jin-Baek Kim, Tae-Hwan Oh, Kyoungmi Kim
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599589
ARC/Bilayer
Isao Nishimura, Hiroyuki Ishii, Norihiko Sugie, Naka-atsu Yoshimura, Masato Tanaka, Hiromi Egawa, Keiji Konno, Makoto Sugiura, Hikaru Sugita, et al.
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598367
Takahiro Sakaguchi, Tomoyuki Enomoto, Yasuyuki Nakajima
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598715
Runhui Huang, Heping Wang, Anwei Qin
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598876
Tetsuya Shinjo, Satoshi Takei, Yasushi Sakaida, Anwei Qin, Yasuyuki Nakajima
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599249
MyoungSoo Kim, HakJoon Kim, KewChan Shim, JeHa Jeon, MyungGoon Gil, YongWook Song, Tomoyuki Enomoto, Takahiro Sakaguchi, Yasuyuki Nakajima
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599434
Yoshiomi Hiroi, Takahiro Kishioka, Rikimaru Sakamoto, Daisuke Maruyama, Yasushi Sakaida, Takashi Matsumoto, Yasuyuki Nakajima, SangMun Chon, YoungHo Kim, et al.
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599421
Yool Kang, Jin Hong, Shi-Yong Lee, Hyung-Rae Lee, Man-Hyoung Ryoo, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599484
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599622
James B. Claypool, Marc Weimer, Vandana Krishnamurthy, Wendy Gehoel, Koen van Ingen Schenau
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599988
Yeon Hwa Lim, Young Keun Kim, Jae Sung Choi, Jeong Gun Lee
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600437
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600697
Jean-Damien Chapon, Catherine Chaton, Pascal Gouraud, Marcel Broekaart, Scott Warrick, Isabelle Guilmeau, Yorick Trouiller, Jerome Belledent
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.601742
EUV/E-beam
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598763
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600172
Taku Hirayama, Daiju Shiono, Shogo Matsumaru, Toshiyuki Ogata, Hideo Hada, Junichi Onodera, Tadashi Arai, Toshio Sakamizu, Atsuko Yamaguchi, et al.
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600416
Sucheta Mukund Gorwadkar, Taro Itatani, Hiroshi Itatani
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600444
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600511
Wang Yueh, Heidi B. Cao, Vani Thirumala, Hokkin Choi
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600540
Immersion
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.597003
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598618
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598686
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599157
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599314
Andrew K. Whittaker, Idriss Blakey, Heping Liu, David J. T. Hill, Graeme A. George, Will Conley, Paul Zimmerman
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600630
J. Christopher Taylor, Ramzy Shayib, Sumarlin Goh, Charles R. Chambers, Will Conley, Shang-Ho Lin, C. Grant Willson
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600771
George Chumanov, David D. Evanoff Jr., Igor Luzinov, Viktor Klep, Bogdan Zdryko, Will Conley, Paul Zimmerman
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.601479
EUV/E-beam
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.602087
LER
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.604401
Novel Materials/Applications
Chang-Ho Noh, Jin-Young Kim, Ho-Chul Lee, Ok-Chae Hwang, Sung-Heon Cho, Ki-Yong Song, Jong-Min Kim
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.597281
Warren W. Flack, Ha-Ai Nguyen, Elliott Capsuto, Kelly Abreau
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598208
Warren W. Flack, Ha-Ai Nguyen, Mark Neisser, Ernesto Sison, Ping Hung Lu, Bob Plass, Toshimichi Makii, Yoshio Murakami
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598469
Yoshiyuki Kono, Atsushi Sekiguchi, Yoshihiko Hirai, Shigeo Arasaki, Koichi Hattori
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.598607
Jianxin Zhu, David N. Tomes Sr., Frank Yaghmaie, Rosemary Bell
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599176
Novel Processing
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599565
Novel Materials/Applications
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600269
Sucheta Gorwadkar, Taro Itatani, Masanori Komuro, Akinori Shiotani, Hiroshi Itatani
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600178
Taro Itatani, Sucheta Gorwadkar, Akinori Shiotani, Masahiro Igusa, Kenji Yonei, Joji Maeda, Hiroshi Itatani
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600190
Yasushi Washio, Takahiro Senzaki, Yasuo Masuda, Koji Saito, Hiroyuki Obiya
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600227
Koichi Misumi, Koji Saito, Hiroyuki Obiya
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600257
Glenn Chapman, David Poon, Chinheng Choo, Yuqiang Tu, James Dykes, Jun Wang, Jun Peng, Willy Lennard, Karen Kavanagh
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.600463
Pattern Collapse/Defectivity
Proceedings Volume Advances in Resist Technology and Processing XXII, (2005) https://doi.org/10.1117/12.599152