4 May 2005 Novel negative tone photodefinable low dielectric constant hybrid films
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Proceedings Volume 5753, Advances in Resist Technology and Processing XXII; (2005); doi: 10.1117/12.599989
Event: Microlithography 2005, 2005, San Jose, California, United States
Abstract
Multifunctional films have the potential to reduce the number of processing steps to prepare various complex electronic devices and thereby reduce the cost of manufacturing the device and increase the throughput of the process. By combining low dielectric thin film and photoresist technologies into one material, such an advantage could be provided to electronics device markets. Air Products and Chemicals has discovered negative tone photodefinable films having dielectric constant values less than 3.0 that are developable in water and/or aqueous TMAH solutions. The low dielectric films produced via a novel reaction pathway involving the use of photoacid generators (PAGs) provides a versatile link to various feature sizes depending on the choice of radiation source and PAG used. Specific examples of film properties and processing latitude will be presented for these developmental materials.
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Thomas J. Markley, Scott J. Weigel, Chris P. Kretz, "Novel negative tone photodefinable low dielectric constant hybrid films", Proc. SPIE 5753, Advances in Resist Technology and Processing XXII, (4 May 2005); doi: 10.1117/12.599989; https://doi.org/10.1117/12.599989
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KEYWORDS
Dielectrics

Lithography

Scanning electron microscopy

Ultraviolet radiation

Polymers

Polymer thin films

Mercury

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