A methodology to calibrate line-end gauge position for better modeling performance

Chi-Yuan Hung; Ching-Heng Wang; Qing-Wei Liu

doi:10.1117/12.597284

12 May 2005 A methodology to calibrate line-end gauge position for better modeling performance

Chi-Yuan Hung, Ching-Heng Wang, Qing-Wei Liu

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.597284
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Model-Based Optical Proximity Correction has become a standard practice for 130nm technology node and below. A physically realistic model that is adequately calibrated contains the information that can be used for process predictions and analysis of a given process. But there still are some unknown physics in the process, that’s why we need to recommend some methodologies for implementing calibrated models for low k1 process. On the other hand, line-end is one of the most difficult 2-D configurations to model and simulate accurately because of intrinsic localized lower/higher threshold compared with 1-D structures. This problem is quite unavoidable especially when people keep constant threshold modeling approach. The objective of this study is to provide a methodology for different line-end modeling gauge types and positions, and still maintain constant threshold modeling. Here, we choose a 0.7NA ArF process empirical dataset for modeling experiments. Among all gauge types and modeling algorithms, the off-center 10% of main feature line-width gauge type with constant threshold model has overall best performance due to: 1)Quick convergent model fitting time; 2)Best common fitting, simulation and correction results; 3)More stable than variable-threshold model.

Citation Download Citation

Chi-Yuan Hung, Ching-Heng Wang, and Qing-Wei Liu "A methodology to calibrate line-end gauge position for better modeling performance", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.597284

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available