A novel focus monitoring method using double side chrome mask

Yoshihiro Shiode; Hiroshi Morohoshi; Atsushi Takagi; Kohei Fujimaru; Kazushi Mizumoto; Yuki Takahashi

doi:10.1117/12.600170

12 May 2005 A novel focus monitoring method using double side chrome mask

Yoshihiro Shiode, Hiroshi Morohoshi, Atsushi Takagi, Kohei Fujimaru, Kazushi Mizumoto, Yuki Takahashi

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.600170
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

In order to measure the focus control performance on exposure tools with high accuracy, we developed a novel focus monitoring method, entitled Z-SPIN. The features of this Z-SPIN method are the high resolution focus measurement accuracy of < 1nm and process robustness. We therefore began by quantitatively analyzing the issues exposure tools were having through the use of the Z-SPIN method. From this examination result, we demonstrate a robust focus control solution with Z-SPIN mask. In parallel, through the determination of the focus budget with the new focus control technique, a significant improvement of the focus performance on exposure tools is shown. Finally, by tightening focus control, we examined the viability of extending the lifetime of exposure tools as well as enabling device shrinking.

Citation Download Citation

Yoshihiro Shiode, Hiroshi Morohoshi, Atsushi Takagi, Kohei Fujimaru, Kazushi Mizumoto, and Yuki Takahashi "A novel focus monitoring method using double side chrome mask", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.600170

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